EQUIPMENT LINE-UP

Wafer Hybrid Bonder
Product Line-up

From production-proven 8"/12" bonders to next-generation Sub-100nm systems — LTrin's three core technologies power every product.

12" DIRECT / HYBRID BONDER

LTRIN3000

Void-free Bonding 3-Module Architecture 300mm Ready

A 300mm-capable automated Direct/Hybrid Bonder built around a three-module architecture — a Cleanable Plasma & Cleaning Hybrid Module, a Wafer Bonding Module, and an IR Inspection Module — for void-free, high-yield bonding. Combined with Real-view alignment and RF induction heating, LTRIN3000 targets Sub-100nm overlay performance.

Wafer Size
8" ~ 12" compatible
Bonding Strength
≥ 2.3 J/m²
Throughput
≥ 20 wph
Process
Void-free, room-temp, low vacuum
Inspection
Automatic defect inspection (IR)
8" THERMOCOMPRESSIVE (TC) BONDER FOR CIS

LTRIN2000

Production-qualified CIS Specialized

An 8" thermocompression (TC) bonder specialized for CIS (image sensor) wafers, combining RF induction heating with in-situ alignment and bonding in a single chamber. Production-qualified and approved on a major domestic manufacturer's line.

Heating
RF Induction, < 550℃
Heating Rate
> 120℃/min (max. 230℃/min)
Pressing
Servo Press, max. 60 kN
Alignment Accuracy
< ± 1.0 µm
Repeatable Accuracy
< ± 0.5 µm
Chamber
Pressurized, < 2,000 torr / 4-gas ports
8" TC BONDER FOR MEMS

Morian200RA

World-first RF Induction Heater MEMS Specialized

An 8" TC bonder specialized for MEMS wafer bonding, featuring the world's first commercialized RF induction heater. A wide, precisely controllable heating-rate range gives excellent results on warpage-sensitive substrates.

Heating Rate
45 ~ 200℃/min (variable)
Max Heating Rate
Up to 230℃/min
Rapid Heating
RT → 550℃ at 200℃/min+
Sizes Supported
4" / 6" / 8" / 12"
Temp. Uniformity
± 1%
MANUAL WAFER / DIE BONDER

Manual Bonder

AuSn Eutectic Bonding Void-free / Anti-scratch

A manual bonder for high-strength AuSn eutectic bonding, delivering void-free, anti-scratch bonds verified by SAM and SEM inspection — well suited for hermetic packaging and specialty die/wafer bonding applications.

Bonding Type
AuSn Eutectic (e.g. Au80%Sn20%)
Max Process Temp
~ 500℃
Max Process Force
100 kN
Temp. Uniformity
≤ ± 1%
Pressure Uniformity
< ± 3%
Throughput
≥ 3 wph

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