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Title MEMS manufacturing: Singapore's A*STAR develops nanostructure printing, MEMS etch processes Date Written 2018.04.03 11:55
Writer LTrin Co.Ltd Views 2393

Semiconductor Engineering - Mar 27, 2018


The research institute has developed a two-step plasma etching process,

which produces vias with minimal dimensions down to 1.5 microns. 

The process also enables smooth sidewalls with angles of around 70 degrees.  

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