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Title Nanusens raises $2.1 million to develop NEMS devices in CMOS process Date Written 2017.09.26 11:28
Writer LTrin Co.Ltd Views 3574

MEMS Journal - Sep 21, 2017


 The company's NEMS based sensors are made using standard CMOS processes.  

In the Nanusens process, the inter metal dielectric is etched away through the pad

openings in the passivation layer using vapor HF to create the nano-sensor structures. 

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